PRELIMINARY EVALUATION OF CO-POLYMERS OF METHYL-METHACRYLATE AND ACYLOXIMINO METHACRYLATE AS DEEP UV RESISTS

被引：37

作者：

WILKINS, CW

REICHMANIS, E

CHANDROSS, EA

机构：

来源：

关键词：

D O I：

10.1149/1.2129505

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2510 / 2513

页数：4

共 8 条

[1] APPELBAUM J, 1975, OCT P KOD MICR SEM I
[2] BOWDEN MJ, 1979, SOLID STATE TECHNOL, V22, P72
[3] PHOTOPOLYMERIZATION INITIATED BY O-ACYLOXIMES
DELZENNE, GA
LARIDON, U
PEETERS, H
[J]. EUROPEAN POLYMER JOURNAL, 1970, 6 (07) : 933 - &
[4] DEEP-UV CONFORMABLE-CONTACT PHOTOLITHOGRAPHY FOR BUBBLE CIRCUITS
LIN, BJ
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1976, 20 (03) : 213 - 221
[5] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320
[6] NAKANE Y, 1979, SEMICONDUCTOR INT
[7] WILKINS CL, UNPUBLISHED
[8] YAMASHITA Y, 1979, 15TH S EL ION PHOT B