DEEP-UV CONFORMABLE-CONTACT PHOTOLITHOGRAPHY FOR BUBBLE CIRCUITS

被引：31

作者：

LIN, BJ ^{[1
]}

机构：

[1] IBM CORP THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

关键词：

D O I：

10.1147/rd.203.0213

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：213 / 221

页数：9

共 15 条

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[2] CLARKE P, 1971, Patent No. 3616450
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[6] HAUSE FL, 1975, FEB SPSE S MICR PHOT
[7] DEEP UV LITHOGRAPHY
LIN, BJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1317 - 1320
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[9] LIN BJ, 1972, J OPT SOC AM, V62, P977
[10] INSTRUMENTATION FOR CONFORMABLE PHOTOMASK LITHOGRAPHY
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