FACTORS AFFECTING ADHERENCE OF CHEMICALLY VAPOR-DEPOSITED COATINGS

被引：11

作者：

BRYANT, WA

MEIER, GH

机构：

[1] WESTINGHOUSE ASTRONUCL LAB,PITTSBURGH,PA 15236

[2] UNIV PITTSBURGH,DEPT MET & MAT ENGN,PITTSBURGH,PA 15261

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312742

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：719 / 724

页数：6

共 14 条

[1]

[Anonymous], 1966, J ELECTROCHEM SOC

[2] KINETICS OF CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J].

BRYANT, WA ;

MEIER, GH .

[3]

BRYANT WA, 1971, 2ND P INT C CHEM VAP, P409

[4]

BRYANT WA, 1971, THESIS U PITTSBURGH

[5]

CHILDS WJ, 1950, T ASM, V42, P105

[6]

DONALDSON JG, 1966, 6853 US BUR MIN REP

[7]

FEDERER JI, 1972, 3RD P INT C CHEM VAP, P591

[8]

Glassner A., 1957, ANL5750

[9]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[10]

OWEN LW, 1959, METALLURGIA, V59, P165