CHARACTERIZATION OF POLYIMIDE/METAL INTERFACES BY RBS, AES, XPS AND TEM

被引：1

作者：

Kurosaki, Kazuo ^{[1
]}

Watanabe, Hiroyuki ^{[1
]}

Maruyama, Tatsuya ^{[1
]}

机构：

[1] Fuji Xerox Co Ltd, Corp Res Lab, Anal Res Ctr, Minamiashigara, Kanagawa 25001, Japan

来源：

ANALYTICAL SCIENCES | 1991年 / 7卷

关键词：

D O I：

10.2116/analsci.7.Supple_1651

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

In the system of polyimide(PI)/metal, the oxidation of metal at both metal surface and PI/metal interface and the diffusion of metal to PI were infered from RBS measurement and TEM observation. These were enhanced by curing in some cases. The AES and XPS depth profiles of metal, carbon and oxygen across the interface were consistent with the results of RBS and TEM. The formation of metal oxide would be interpreted in terms of the defect structure of PI, that was proved by IR and TG-MS measurements.

引用

页码：1651 / 1654

页数：4

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