PHOTOABSORPTION SPECTRA OF SI(CH3O)4, SI(CH3O)2(C6H5)2,SI(C2H5O)4,TI(I-C3H7O), AND BCL3 IN THE REGION OF 6-9.6 EV

被引:3
作者
AWAZU, K [1 ]
ONUKI, H [1 ]
IBUKI, T [1 ]
机构
[1] KYOTO UNIV, FUSHIMI KU, KYOTO 612, JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1993年 / 32卷 / 6B期
关键词
SILICON ALKOXIDES; TETRAISOPROPYL ORTHOTITANATE; BORON TRICHLORIDE; VUV PHOTOABSORPTION; CHEMICAL VAPOR DEPOSITION;
D O I
10.1143/JJAP.32.L869
中图分类号
O59 [应用物理学];
学科分类号
摘要
The total photoabsorption cross sections (sigma(t)) of gaseous Si(RO)4 (RO=CH3O and C2H5O), Si(CH3O)2(C6H5)2: Ti(i-C3H7O)4, and BCl3 have been measured in the region of hv=6-9.6 eV. In the compounds containing alkoxy groups, the photoabsorption bands observed around 6.9 eV and 7.7-8.5 eV are tentatively assigned as the 3s and 3p Rydberg excitations of the non-bonding electron of an oxygen atom (n(o)), respectively. The sigma(t) values for 3p-->n(o) Rydberg lie in the region of 40-50 Mb. The photoabsorption bands of BCl3 observed at 7.1, 8.35, and 9.1 eV, in which the peak at 7.1 eV has a large at 300 Mb, are assigned as the pi* valence shell, 4s, and 4p Rydberg transitions of the outermost lone pair electron of a chlorine atom, respectively.
引用
收藏
页码:L869 / L872
页数:4
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