EVALUATION OF A HIGH ACCURACY REFLECTOMETER FOR SPECULAR MATERIALS

被引：2

作者：

HERNICZ, RS ^{[1
]}

DEWITT, DP ^{[1
]}

机构：

[1] PURDUE UNIV,LAFAYETTE,IN 47906

来源：

APPLIED OPTICS | 1973年 / 12卷 / 10期

关键词：

D O I：

10.1364/AO.12.002454

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：2454 / 2460

页数：7

共 21 条

[1] PRECISION MEASUREMENT OF ABSOLUTE SPECULAR REFLECTANCE WITH MINIMIZED SYSTEMATIC ERRORS [J].

BENNETT, HE ;

KOEHLER, WF .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1960, 50 (01) :1-6

[2] ACCURATE METHOD FOR DETERMINING PHOTOMETRIC LINEARITY [J].

BENNETT, HE .

APPLIED OPTICS, 1966, 5 (08) :1265-+

[3]

BENNETT HE, 1967, PHYSICS THIN FILMS, V4

[4] FURTHER COMMENTS ON AREAL SENSITIVITY OF END-ON PHOTOMULTIPLIERS [J].

BIRTH, GS ;

DEWITT, DP .

APPLIED OPTICS, 1971, 10 (03) :687-&

[5]

DUNN ST, 1965, THESIS OKLAHOMA STAT

[6]

FOWLER P, AD418456

[7]

FOWLER P, 1960, THESIS MIT

[8] INFRARED REFLECTANCE OF EVAPORATED METAL FILMS [J].

GATES, DM ;

SHAW, CC ;

BEAUMONT, D .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1958, 48 (02) :88-89

[9]

HAHN YH, 1972, ELECTRO OPT SYS DESI, V4, P18

[10] TECHNIQUE FOR MEASURING PHOTOMETRIC ACCURACY [J].

HAWES, RC .

APPLIED OPTICS, 1971, 10 (06) :1246-&

← 1 2 3 →