PHOTOSENSITIVE POLYIMIDES DEVELOPABLE WITH BASIC AQUEOUS-SOLUTIONS (II)

被引：13

作者：

TAKANO, K ^{[1
]}

MIKOGAMI, Y ^{[1
]}

NAKANO, Y ^{[1
]}

HAYASE, R ^{[1
]}

HAYASE, S ^{[1
]}

机构：

[1] TOSHIBA CO LTD,CTR RES & DEV,CHEM LAB,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1992年 / 46卷 / 07期

关键词：

D O I：

10.1002/app.1992.070460702

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Positive and negative photosensitive polyimides developable with basic aqueous solutions are reported. The results consist of poly amic acids and naphthoquinone diazides in which sulfonate groups have to be substituted at 4-position. It depends on the naphthoquinone structures whether positive or negative patterns are obtained. In order to fabricate resist patterns, High-Temperature-Post-Exposure-Process (HIT-PEB) must be utilized. The reaction mechanisms are also discussed.

引用

页码：1137 / 1146

页数：10

共 16 条

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