UNIFORM-STRESS TUNGSTEN ON X-RAY MASK MEMBRANES VIA HE-BACKSIDE TEMPERATURE HOMOGENIZATION

被引：12

作者：

MONDOL, M

LI, HY

OWEN, G

SMITH, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587423

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：4024 / 4027

页数：4

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