A TECHNIQUE FOR THE DETERMINATION OF STRESS IN THIN-FILMS

[1] MECHANICAL STRENGTH OF THIN FILMS OF METALS [J]. PHYSICAL REVIEW, 1955, 100 (06): : 1657 - 1661

[2] Beams W., 1959, P INT C STRUCTURE PR, P183

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] SURFACE CHARGES INDUCED BY MECHANICAL STRESSES IN SILICON-SILICON OXIDE INTERFACE [J]. SOLID-STATE ELECTRONICS, 1971, 14 (07) : 639 - +

[5] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2429 - +

[6] PENETRATION OF MAGNETIC FIELDS INTO SUPERCONDUCTORS .3. MEASUREMENTS ON THIN FILMS OF TIN, LEAD AND INDIUM [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1951, 208 (1094): : 391 - 408

[7] HIGH-RESOLUTION ION-BEAM LITHOGRAPHY AT LARGE GAPS USING STENCIL MASKS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (05) : 457 - 459

[8] SILICON-NITRIDE SINGLE-LAYER X-RAY MASK [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (04): : 1017 - 1021

[9] THERMAL-STRESSES AND CRACKING RESISTANCE OF DIELECTRIC FILMS (SIN, SI3N4, AND SIO2) ON SI SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) : 2423 - 2426

[10] SMITH DO, 1959, J APPL PHYS, V30, P264

[1] MECHANICAL STRENGTH OF THIN FILMS OF METALS [J]. PHYSICAL REVIEW, 1955, 100 (06): : 1657 - 1661

[2] Beams W., 1959, P INT C STRUCTURE PR, P183

[3] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02): : 105 - 123

[4] SURFACE CHARGES INDUCED BY MECHANICAL STRESSES IN SILICON-SILICON OXIDE INTERFACE [J]. SOLID-STATE ELECTRONICS, 1971, 14 (07) : 639 - +

[5] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2429 - +

[6] PENETRATION OF MAGNETIC FIELDS INTO SUPERCONDUCTORS .3. MEASUREMENTS ON THIN FILMS OF TIN, LEAD AND INDIUM [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1951, 208 (1094): : 391 - 408

[7] HIGH-RESOLUTION ION-BEAM LITHOGRAPHY AT LARGE GAPS USING STENCIL MASKS [J]. APPLIED PHYSICS LETTERS, 1983, 42 (05) : 457 - 459

[8] SILICON-NITRIDE SINGLE-LAYER X-RAY MASK [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 21 (04): : 1017 - 1021

[9] THERMAL-STRESSES AND CRACKING RESISTANCE OF DIELECTRIC FILMS (SIN, SI3N4, AND SIO2) ON SI SUBSTRATES [J]. JOURNAL OF APPLIED PHYSICS, 1978, 49 (04) : 2423 - 2426

[10] SMITH DO, 1959, J APPL PHYS, V30, P264