Langmuir probe measurements in

被引：60

作者：

Brockhaus, A. ^{[1
]}

Borchardt, C. ^{[1
]}

Engemann, J. ^{[1
]}

机构：

[1] Berg Univ Gesamthsch Wuppertal, Forschungszentrum Mikrostrukturtech, D-42097 Wuppertal, Germany

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1994年 / 3卷 / 04期

关键词：

D O I：

10.1088/0963-0252/3/4/011

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

We developed and tested a Langmuir double-probe systems suitable for measurement in industrial environments. where quick and easy-to-handle methods are required. Data acquisition and calculation of plasma parameters are controlled by a personal computer. An evaluation algorithm is presented and its properties are briefly discussed. Successful operation of the system can be proved in a variety of different plasma configurations, namely in radiofrequency driven, pulsed direct current ana microwave plasmas. Typical measurements and the conclusions that have been drawn are presented. Plasma densities were in the range 10(8)-10(13) cm(-3). From the end user's point of view the main application areas are trouble-shooting, on-line process control and plasma source characterization during the development stages of a plasma plant.

引用

页码：539 / 544

页数：6

共 20 条

[1] MEASURING METHODS OF PLASMA PARAMETERS BY A DIFFERENTIATING AND MODULATING DOUBLE PROBE [J].