CONTROL OF PLASMA PARAMETERS IN A CYLINDER SYMMETRICAL CAPACITIVELY COUPLED RF ION-SOURCE BY USE OF A MAGNETIC-FIELD

被引：7

作者：

KORZEC, D

ENGEMANN, J

WOLTERS, R

机构：

来源：

VACUUM | 1989年 / 39卷 / 11-12期

关键词：

D O I：

10.1016/0042-207X(89)91118-4

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：1185 / 1190

页数：6

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