PLASMA CHARACTERIZATION IN SPUTTERING PROCESSES USING THE LANGMUIR PROBE TECHNIQUE

[1] [Anonymous], 1965, ELECT PROBES

[2] PLASMA DIAGNOSTICS AND ENERGY TRANSPORT OF A DC DISCHARGE USED FOR SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (07) : 3047 - &

[3] Bohm D., 1949, CHARACTERISTICS ELEC

[4] BROWN SC, 1966, INTRO ELECTRICAL DIS

[5] PRESSURE-DEPENDENCE OF ELECTRON-TEMPERATURE USING RF-FLOATED ELECTROSTATIC PROBES IN RF PLASMAS [J]. APPLIED PHYSICS LETTERS, 1977, 30 (07) : 316 - 319

[6] CANTIN A, 1974, IEE C PUBL, V118, P625

[7] SATURATION ION CURRENTS TO LANGMUIR PROBES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) : 675 - &

[8] CHUNG PM, 1975, ELECTRIC PROBES STAT

[9] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[10] INVESTIGATION OF SPUTTERED BETA-TANTALUM THIN FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (02): : 80 - &

[1] [Anonymous], 1965, ELECT PROBES

[2] PLASMA DIAGNOSTICS AND ENERGY TRANSPORT OF A DC DISCHARGE USED FOR SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (07) : 3047 - &

[3] Bohm D., 1949, CHARACTERISTICS ELEC

[4] BROWN SC, 1966, INTRO ELECTRICAL DIS

[5] PRESSURE-DEPENDENCE OF ELECTRON-TEMPERATURE USING RF-FLOATED ELECTROSTATIC PROBES IN RF PLASMAS [J]. APPLIED PHYSICS LETTERS, 1977, 30 (07) : 316 - 319

[6] CANTIN A, 1974, IEE C PUBL, V118, P625

[7] SATURATION ION CURRENTS TO LANGMUIR PROBES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (3P1) : 675 - &

[8] CHUNG PM, 1975, ELECTRIC PROBES STAT

[9] CLEMENTS RM, 1978, J VAC SCI TECHNOL, V15, P193, DOI 10.1116/1.569453

[10] INVESTIGATION OF SPUTTERED BETA-TANTALUM THIN FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (02): : 80 - &