INVESTIGATION OF SPUTTERED BETA-TANTALUM THIN FILMS

被引：18

作者：

COOK, HC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1967年 / 4卷 / 02期

关键词：

D O I：

10.1116/1.1492526

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：80 / &

共 26 条

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[2]

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[3]

CHARSCHAN SS, 1964, ELECTROCHEM TECHNOL, V2, P5

[4] GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS [J].

CHOPRA, KL .

[5] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].

CHOPRA, KL .

[6]

COBINE JD, 1957, GASEOUS CONDUCTORS, P32

[7]

COBINE JD, 1957, GASEOUS CONDUCTORS, P213

[8]

COBINE JD, 1957, GASEOUS CONDUCTORS, P134

[9]

COBINE JD, 1957, GASEOUS CONDUCTORS, P22

[10]

DELEEUW JH, 1963, PHYSICOCHEMICAL DIAG, P65