INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS

[1] NUCLEATION AND INITIAL GROWTH OF SINGLE-CRYSTAL FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (02): : 79 - &

[2] BASSETT GA, 1959, STRUCTURE PROPERTIES, P11

[3] BASSETT GA, 1960, P EUR REG C ELECTRON, V1, P270

[4] ELECTRICAL RESISTIVITY OF THIN SINGLE-CRYSTAL GOLD FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1699 - &

[5] GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (05) : 140 - +

[6] CHOPRA KL, TO BE PUBLISHED

[7] CHOPRA KL, 1964, P INTERNATIONAL C SI, P371

[8] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2785 - &

[9] LAWLESS KR, 1965, J VAC SCI TECHNOL, V2, P29

[10] NEUGEBAUER CA, 1959, STRUCTURE PROPERTIES, P11

[1] NUCLEATION AND INITIAL GROWTH OF SINGLE-CRYSTAL FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (02): : 79 - &

[2] BASSETT GA, 1959, STRUCTURE PROPERTIES, P11

[3] BASSETT GA, 1960, P EUR REG C ELECTRON, V1, P270

[4] ELECTRICAL RESISTIVITY OF THIN SINGLE-CRYSTAL GOLD FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1699 - &

[5] GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E) [J]. APPLIED PHYSICS LETTERS, 1965, 7 (05) : 140 - +

[6] CHOPRA KL, TO BE PUBLISHED

[7] CHOPRA KL, 1964, P INTERNATIONAL C SI, P371

[8] POSSIBLE INFLUENCE OF ELECTRIC CHARGE EFFECTS ON INITIAL GROWTH PROCESSES OCCURRING DURING VAPOR DEPOSITION OF METAL FILMS ONTO SUBSTRATES INSIDE ELECTRON MICROSCOPE [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) : 2785 - &

[9] LAWLESS KR, 1965, J VAC SCI TECHNOL, V2, P29

[10] NEUGEBAUER CA, 1959, STRUCTURE PROPERTIES, P11