GROWTH OF SPUTTERED VS EVAPORATED METAL FILMS

被引：59

作者：

CHOPRA, KL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1966年 / 37卷 / 09期

关键词：

D O I：

10.1063/1.1708871

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3405 / &

共 24 条

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[4]

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[6] ELECTRICAL RESISTIVITY OF THIN SINGLE-CRYSTAL GOLD FILMS [J].

CHOPRA, KL ;

BOBB, LC ;

FRANCOMBE, MH .

JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) :1699-&

[7] GROWTH OF THIN METAL FILMS UNDER APPLIED ELECTRIC FIELD (VACUUM DEPOSITION COALESCENCE OF NUCLEI E) [J].

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[8] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS [J].

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[9]

CHOPRA KL, 1964, P INTERNATIONAL C SI, P371

[10]

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