ELECTROSTATIC-PROBE ANALYSIS OF MICROWAVE PLASMAS USED FOR POLYMER ETCHING

被引：37

作者：

HEIDENREICH, JE ^{[1
]}

PARASZCZAK, JR ^{[1
]}

MOISAN, M ^{[1
]}

SAUVE, G ^{[1
]}

机构：

[1] UNIV MONTREAL,DEPT PHYS,MONTREAL H3C 3J7,QUEBEC,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583900

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：347 / 354

页数：8

共 18 条

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[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (04) : 2939 - 2946
[9] MOISAN M, 1986, NATO ADV STUDY I RAD
[10] METHODS OF CREATION AND EFFECT OF MICROWAVE PLASMAS UPON THE ETCHING OF POLYMERS AND SILICON.
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Heidenreich, J.
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[J]. Microelectronic Engineering, 1985, 3 (1-4) : 397 - 410