OPTIMIZATION OF THE PARAMETERS INVOLVED IN THE PHOTOCHEMICAL DOPING OF SI WITH A PULSED ARF EXCIMER LASER

被引：15

作者：

FOULON, F

SLAOUI, A

FOGARASSY, E

STUCK, R

FUCHS, C

SIFFERT, P

机构：

来源：

APPLIED SURFACE SCIENCE | 1989年 / 36卷 / 1-4期

关键词：

D O I：

10.1016/0169-4332(89)90933-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：384 / 393

页数：10

共 16 条

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[7]

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MANTELL DA, 1987, P MATER RES SOC S, V74, P141

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[10] LASER GENERATED MICROSTRUCTURES [J].

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