SPUTTERING OF OXIDE FILMS IN PLASMA ANODIZATION OF ALUMINUM

[1] SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES [J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 25 - &

[2] LOCKER LD, 1968, JOM-J MIN MET MAT S, V20, pA23

[3] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[4] TERRY LE, 1964, SCTM3076314 AEC REP

[5] TIBOL GJ, 1964, J ELECTROCHEM SOC, V111, P1363

[1] SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES [J]. APPLIED PHYSICS LETTERS, 1968, 12 (02) : 25 - &

[2] LOCKER LD, 1968, JOM-J MIN MET MAT S, V20, pA23

[3] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[4] TERRY LE, 1964, SCTM3076314 AEC REP

[5] TIBOL GJ, 1964, J ELECTROCHEM SOC, V111, P1363