SPUTTERING DUE TO NEGATIVE OXYGEN IONS IN OXYGEN DISCHARGES

[1] JENNINGS TA, 1967, J ELECTROCHEM SOC, V114, P1133

[2] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2703 - +

[3] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[4] ROCKWOOD GH, 1941, A I E E TECHNICAL PA, P4

[5] ION BALANCE OF OXYGEN DC GLOW DISCHARGE [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 262 (1310) : 519 - +

[6] PLASMA ANODIZED ALUMINUM OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (12) : 1368 - 1372

[7] LOW-ENERGY SPUTTERING YIELDS IN HG [J]. PHYSICAL REVIEW, 1958, 112 (04): : 1120 - 1124

[8] OXIDE FILMS GROWN ON GAAS IN AN OXYGEN PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (07) : 2924 - +

[1] JENNINGS TA, 1967, J ELECTROCHEM SOC, V114, P1133

[2] SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES [J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (09) : 2703 - +

[3] THE FORMATION OF METAL OXIDE FILMS USING GASEOUS AND SOLID ELECTROLYTES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1240 - 1245

[4] ROCKWOOD GH, 1941, A I E E TECHNICAL PA, P4

[5] ION BALANCE OF OXYGEN DC GLOW DISCHARGE [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 262 (1310) : 519 - +

[6] PLASMA ANODIZED ALUMINUM OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (12) : 1368 - 1372

[7] LOW-ENERGY SPUTTERING YIELDS IN HG [J]. PHYSICAL REVIEW, 1958, 112 (04): : 1120 - 1124

[8] OXIDE FILMS GROWN ON GAAS IN AN OXYGEN PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (07) : 2924 - +