SUPERCONDUCTING YBA2CU3O7-X THIN-FILMS ON SILVER SUBSTRATES BY INSITU PLASMA-ENHANCED METALORGANIC CHEMICAL VAPOR-DEPOSITION

被引：27

作者：

ZHAO, J

LI, YQ

CHERN, CS

NORRIS, P

GALLOIS, B

KEAR, B

WESSELS, BW

机构：

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 01期

关键词：

D O I：

10.1063/1.104400

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An in situ microwave plasma-enhanced metalorganic chemical vapor deposition process was used to fabricate highly c-axis oriented YBa2Cu3O7-x superconducting thin films on metallic Ag substrates. The films were deposited at a reduced substrate temperature of 740-degrees-C in about 270 Pa of N2O ambient. Magnetic susceptibilities versus temperature of the as-deposited films show attainment of zero resistance of 85 K and composition of single (high T(c)) phase. X-ray diffraction measurements reveal that the films deposited at 740-degrees-C have highly preferential orientation of the crystallite c axes perpendicular to the substrate surface.

引用

页码：89 / 91

页数：3

共 23 条

[21] DEPOSITION OF HIGH-TC SUPERCONDUCTING Y-BA-CU-O THIN-FILMS AT LOW-TEMPERATURES USING A PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION APPROACH [J].