AN ANALYSIS ON MICROSTRUCTURAL GROWTH-PROCESS IN ELECTROLESS CONIREP FILMS FOR PERPENDICULAR MAGNETIC RECORDING MEDIA

被引:9
作者
HOMMA, T
OSAKA, T
机构
[1] Department of Applied Chemistry, Waseda University, Okubo, Shinjuku-ku
关键词
D O I
10.1149/1.2069008
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The segregated microstructure and the growth process of electroless CoNiReP films were examined using selective chemical etching and heat-treatment methods. The segregated condition in the film changes with an increase in the film thickness up to ca. 200 nm, while it keeps a constant nature with a further increase in the film thickness of up to 2 mum. In the region of thickness over 200 nm, the film consists of high-crystallized particles with 20 nm diam segregating in the nonmagnetic region with low crystallinity. Such a segregation is confirmed to occur from the nucleation stage before forming a continuous film, and the segregated structure is stable with heat-treatment up to 500-degrees-C.
引用
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页码:2925 / 2929
页数:5
相关论文
共 15 条
[11]  
OSAKA T, 1989, J MAG SOC JPN, V13, P779
[12]  
OSAKA T, 1991, J SURF FINISH SOC JP, V42, P283
[13]  
OSAKA T, 1989, J MAG SOC JPN, V13, P85
[14]   BEHAVIOR OF PD-SN AND PD CATALYSTS FOR ELECTROLESS PLATING ON DIFFERENT SUBSTRATES INVESTIGATED BY MEANS OF RUTHERFORD BACKSCATTERING SPECTROSCOPY [J].
SVENDSEN, LG ;
OSAKA, T ;
SAWAI, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1983, 130 (11) :2252-2255
[15]   INITIAL LAYER EFFECTS IN CO-CR FILMS [J].
WUORI, ER ;
JUDY, JH .
IEEE TRANSACTIONS ON MAGNETICS, 1984, 20 (05) :774-775