A KRF OSCILLATOR SYSTEM WITH UNIFORM PROFILES

被引：10

作者：

DENIZ, AV ^{[1
]}

OBENSCHAIN, SP ^{[1
]}

机构：

[1] USN,RES LAB,DIV PLASMA PHYS,WASHINGTON,DC 20375

来源：

OPTICS COMMUNICATIONS | 1994年 / 106卷 / 1-3期

关键词：

D O I：

10.1016/0030-4018(94)90066-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A KrF oscillator system that has produced highly uniform flat-top focal distributions is described. The oscillator system is part of a large laser system that will utilize the echelon-free induced spatial incoherence technique to obtain uniform illumination of planar targets for fusion research. With this system, focal profiles with small long scale length nonuniformities have been obtained. The nonuniformity was determined by performing a least-squares fit to a series of profiles, and calculating the deviation of each fit from a flat-top profile. With a linear fit, the deviation averaged over the series is +/- 0.5%, and with a quadratic fit, it is +/- 1.4%. Details of the oscillator system configuration, focal uniformity measurement techniques, and resulting focal profiles are presented.

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收藏

页码：113 / 122

页数：10

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