MATERIALS AND PROCESSES FOR PREFORM FABRICATION - MODIFIED CHEMICAL VAPOR-DEPOSITION AND PLASMA CHEMICAL VAPOR-DEPOSITION

被引：22

作者：

MACCHESNEY, JB

机构：

来源：

关键词：

D O I：

10.1109/PROC.1980.11826

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1181 / 1184

页数：4

共 45 条

[1] WATER IMPURITY IN LOW-LOSS SILICA FIBER
AINSLIE, BJ
FRANCE, PW
NEWNS, GR
[J]. MATERIALS RESEARCH BULLETIN, 1977, 12 (05) : 481 - 487
[2] FABRICATION OF LONG FIBERS BY AN IMPROVED CHEMICAL VAPOR-DEPOSITION METHOD (HCVD METHOD)
AKAMATSU, T
OKAMURA, K
UEDA, Y
[J]. APPLIED PHYSICS LETTERS, 1977, 31 (03) : 174 - 176
[3] ANDREJCO MJ, 1979, TECH DIG OPTICAL FIB, P48
[4] BARNS RL, UNPUBLISHED
[5] BLANKENSHIP MG, 1979, TECH DIG TOPICAL M O, P10
[6] BUCKLER MJ, 1980, 6TH P EUR C OPT FIB
[7] COHEN LG, 1979, ELECTRON LETT, V15, P12
[8] PRESERVATION OF POLARIZATION IN OPTICAL-FIBRE WAVEGUIDES WITH ELLIPTICAL CORES
DYOTT, RB
COZENS, JR
MORRIS, DG
[J]. ELECTRONICS LETTERS, 1979, 15 (13) : 380 - 382
[9] FLEMING JW, 1980, P FIBER OPTICAL S AM
[10] FUJIWARA K, 1977, 3RD P EUR C OPT FIB