MATERIALS AND PROCESSES FOR PREFORM FABRICATION - MODIFIED CHEMICAL VAPOR-DEPOSITION AND PLASMA CHEMICAL VAPOR-DEPOSITION

被引：22

作者：

MACCHESNEY, JB

机构：

来源：

关键词：

D O I：

10.1109/PROC.1980.11826

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1181 / 1184

页数：4

共 45 条

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MIYASHITA, T
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