ANISOTROPIC DISTRIBUTION OF ATOMIC PAIRS INDUCED BY PREFERENTIAL RESPUTTERING EFFECT IN AMORPHOUS GD-FE AND GD-CO FILMS

被引：32

作者：

NISHIHARA, Y

KATAYAMA, T

YAMAGUCHI, Y

OGAWA, S

TSUSHIMA, T

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 06期

关键词：

D O I：

10.1143/JJAP.17.1083

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1083 / 1088

页数：6

共 18 条

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[2]

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ESHO S, 1976, AIP C P, V34, P331

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[8]

HEIMAN N, 1974, AIP C P, V24, P573

[9]

HEIMAN N, 1976, AIP C P, V29, P130

[10] ROLE OF DC BIAS IN RF SPUTTERING PROCESS OF AMORPHOUS GD-CO FILMS [J].

HIRANO, M ;

KATAYAMA, T ;

KOIZUMI, Y ;

KAWAKAMI, M ;

TSUSHIMA, T .

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1977, 42 (01) :347-348

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