ROLE OF DC BIAS IN RF SPUTTERING PROCESS OF AMORPHOUS GD-CO FILMS

被引：7

作者：

HIRANO, M

KATAYAMA, T

KOIZUMI, Y

KAWAKAMI, M

TSUSHIMA, T

机构：

[1] ELECTROTECH LAB,TANASHI,TOKYO 188,JAPAN

[2] TOKYO ELECT ENGN COLL,CHIYODA KU,TOKYO 101,JAPAN

[3] NIHON UNIV,CHIYODA KU,TOKYO 101,JAPAN

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1977年 / 42卷 / 01期

关键词：

D O I：

10.1143/JPSJ.42.347

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

收藏

页码：347 / 348

页数：2

相关论文

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[1] EFFECTS OF DC BIAS ON FABRICATION OF AMORPHOUS GDCO RF SPUTTERED FILMS
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[5] HIRANO M, TO BE PUBLISHED
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[7] KATAYAMA T, TO BE PUBLISHED