REGISTRATION MARK DETECTION FOR ELECTRON-BEAM LITHOGRAPHY-EL1 SYSTEM

[1] BACK SCATTERING OF ELECTRONS [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) : 1505 - &

[2] CHANG THP, 1977, ELECTRONICS, V50, P89

[3] CHANG THP, 1974, 8TH P INT C EL MICR, V1, P650

[4] DAVIS DE, 1977, IBM J RES DEV, V21, P498, DOI 10.1147/rd.216.0498

[5] DAVIS DE, 1977, Patent No. 4056730

[6] DAVIS DE, 1979, IBM TECH DISCLOSURE, V22, P140

[7] CORRECTION OF NONLINEAR DEFLECTION DISTORTION IN A DIRECT EXPOSURE ELECTRON-BEAM SYSTEM [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (06) : 506 - 513

[8] FRIEDRICH H, 1976, 7TH P INT C EL ION B, P340

[9] GESHNER RA, 1978, RCA ENG, V24, P47

[10] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392

[1] BACK SCATTERING OF ELECTRONS [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (08) : 1505 - &

[2] CHANG THP, 1977, ELECTRONICS, V50, P89

[3] CHANG THP, 1974, 8TH P INT C EL MICR, V1, P650

[4] DAVIS DE, 1977, IBM J RES DEV, V21, P498, DOI 10.1147/rd.216.0498

[5] DAVIS DE, 1977, Patent No. 4056730

[6] DAVIS DE, 1979, IBM TECH DISCLOSURE, V22, P140

[7] CORRECTION OF NONLINEAR DEFLECTION DISTORTION IN A DIRECT EXPOSURE ELECTRON-BEAM SYSTEM [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (06) : 506 - 513

[8] FRIEDRICH H, 1976, 7TH P INT C EL ION B, P340

[9] GESHNER RA, 1978, RCA ENG, V24, P47

[10] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392