DETERMINATION OF BOND ENERGY OF SILICA GLASS BY MEANS OF ION SPUTTERING INVESTIGATIONS

被引：33

作者：

BACH, H

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS | 1970年 / 84卷 / 01期

关键词：

D O I：

10.1016/0029-554X(70)90728-7

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：4 / &

共 49 条

[41] PLENDL JN, 1963, AFCRL6326 RES REP
[42] RADIATION COMPACTION OF VITREOUS SILICA
PRIMAK, W
KAMPWIRTH, R
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (12) : 5651 - +
[43] FAST-NEUTRON-INDUCED CHANGES IN QUARTZ AND VITREOUS SILICA
PRIMAK, W
[J]. PHYSICAL REVIEW, 1958, 110 (06): : 1240 - 1254
[44] ELLIPSOMETRIC ANALYSIS OF RADIATION DAMAGE IN DIELECTRICS
SCHROEDE.JB
DIESELMA.HD
[J]. JOURNAL OF APPLIED PHYSICS, 1969, 40 (06) : 2559 - &
[45] Schroeder H., 1969, PHYS THIN FILMS ADV, V5, P87
[46] SIMON I, 1957, J AM CERAM SOC, V49, P105
[47] INFLUENCE OF THE ANGLE OF INCIDENCE ON SPUTTERING YIELDS
WEHNER, G
[J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (11) : 1762 - 1765
[48] WHITTON JL, 1966, CAN J PHYS, V44, P996
[49] 1955, LANDOLTBORNSTEIN ZAH, V1