ZIRCONIA METAL INTERFACES STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY

被引：6

作者：

MARIOT, JM ^{[1
]}

HAREL, S ^{[1
]}

HAGUE, CF ^{[1
]}

机构：

[1] ETCA CTME,CTR RECH & ETUD ARCUEIL,F-94114 ARCUEIL,FRANCE

来源：

APPLIED SURFACE SCIENCE | 1993年 / 65-6卷

关键词：

D O I：

10.1016/0169-4332(93)90682-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report X-ray photoelectron spectroscopy (XPS) measurements on low-coverage ZrO2 deposits on Ni, oxidized Ni and oxidized Al substrates. From ZrO2 on Ni deposits we infer that stoichiometric ZrO2 is systematically produced by our deposition technique (ion sputtering of a zirconium target) except at very low coverage (equivalent to the one monolayer range). For ZrO2 deposited on NiO we find that the p-type doping induced by defects is modified and introduces large binding energy shifts (+ 0.6 eV for Ni2P3/2 and -0.6 eV for the Zr3d doublet). A similar effect for alumina is also discussed.

引用

页码：337 / 341

页数：5

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