THICKNESS DEPENDENCE OF HYDROGEN IN A-SI-H FILMS DEPOSITED ON C-SI

被引：6

作者：

CURRIE, JF

DEPELSENAIRE, P

GALARNEAU, S

LECUYER, J

GROLEAU, R

BRUYERE, JC

DENEUVILLE, A

机构：

[1] UNIV MONTREAL,PHYS NUCL LAB,MONTREAL H3C 3J7,QUEBEC,CANADA

[2] CNRS,TRANSIT PHASES GRP,F-38042 GRENOBLE,FRANCE

来源：

JOURNAL DE PHYSIQUE LETTRES | 1981年 / 42卷 / 15期

关键词：

D O I：

10.1051/jphyslet:019810042015037300

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：L373 / L376

页数：4

共 14 条

[1]

AST DG, 1980, J NONCRYST SOLIDS, V35

[2]

BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556

[3]

BRUYERE JC, 1980, J APPL PHYS, V51, P2199, DOI 10.1063/1.327895

[4]

BRUYERE JC, 1980, J PHYS LETT-PARIS, V41, pL27, DOI 10.1051/jphyslet:0198000410202700

[5]

BRUYERE JC, 1980, J PHYS LETT-PARIS, V41, pL31, DOI 10.1051/jphyslet:0198000410203100

[6]

BUSTARRET E, 1981, 8 P CVD GOUV

[7]

DENEUVILLE A, J PHYS C

[8]

GROLEAU R, COMMUNICATION

[9]

HAMDI H, UNPUBLISHED

[10] DEFECTS IN PLASMA-DEPOSITED A-SI-H [J].

KNIGHTS, JC ;

LUCOVSKY, G ;

NEMANICH, RJ .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1979, 32 (1-3) :393-403

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