REACTIVE SILICA .2. NATURE OF SURFACE SILICON HYDRIDES PRODUCED BY CHEMISORPTION OF HYDROGEN

被引:60
作者
MORTERRA, C
LOW, MJD
机构
[1] Department of Chemistry, New York University, New York
关键词
D O I
10.1021/j100722a009
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The pyrolysis of the methoxy groups of methylated Aerosil silica leads to the production of surface Si-OH and SiH2 groups, as indicated by infrared absorptions at 3747 and near 2300 cm-1, respectively. Prolonged out-gassing causes the elimination of hydrogen from these groups and leads to the formation of surface Si radicals. Experiments with electron spin resonance confirm this mechanism. The radical is very reactive and permits the dissociative chemisorption of hydrogen at temperatures as low as 25°. A second surface silane, Si-H, is also formed, but is not stable above 550°. Adsorbed water does not interact extensively with the surface silanes. The latter are stable to oxygen up to 350°. The nature of the surface, the surface species, and their interactions, are discussed.
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页码:327 / +
页数:1
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