METALORGANIC CHEMICAL-VAPOR-DEPOSITION BY PULSED LIQUID INJECTION USING AN ULTRASONIC NOZZLE - TITANIUM-DIOXIDE ON SAPPHIRE FROM TITANIUM(LV) ISOPROPOXIDE

被引：19

作者：

VERSTEEG, VA

AVEDISIAN, CT

RAJ, R

机构：

[1] CORNELL UNIV,DEPT MAT SCI & ENGN,ITHACA,NY 14853

[2] CORNELL UNIV,DEPT MECH & AEROSP ENGN,ITHACA,NY 14853

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1995年 / 78卷 / 10期

关键词：

D O I：

10.1111/j.1151-2916.1995.tb08052.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A new method for metalorganic chemical vapor deposition has been developed in which a precursor solution is directly injected into a reaction chamber. The vaporization of short pulses of liquid is facilitated by atomization with a piezoelectrically operated nozzle. The system has been used successfully to grow oriented, thin TiO2 (rutile) films on sapphire substrates with the crystalline relationship (101)[010](R) parallel to (<1(1)over bar 20>)[0001](s). A film growth rate of approximately 2.5 monolayers of TiO2 (rutile) per pulse was achieved at 650 degrees C for a reactant impingement rate of about 250 monolayers of Ti(OPr1)(4) per pulse.

引用

页码：2763 / 2768

页数：6

共 14 条

[1]

BRADLEY DC, 1978, METAL ALKOXIDES, P63

[2] EPITAXIAL TIO2 AND VO2 FILMS PREPARED BY MOCVD [J].