SOLUTION PRECURSOR CHEMICAL VAPOR-DEPOSITION OF TITANIUM-OXIDE THIN-FILMS

被引：69

作者：

LU, JP

WANG, JD

RAJ, R

机构：

[1] Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, Bard Hall

来源：

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/0040-6090(91)90488-J

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：L13 / L17

页数：5

共 9 条

[1] BRADLEY DC, 1978, METAL ALKOXIDES, P63
[2] TITANIUM-DIOXIDE DIELECTRIC FILMS FORMED BY RAPID THERMAL-OXIDATION
BURNS, GP
[J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (05) : 2095 - 2097
[3] ALGORITHMS FOR THE RAPID SIMULATION OF RUTHERFORD BACKSCATTERING SPECTRA
DOOLITTLE, LR
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 9 (03) : 344 - 351
[4] KERN W, 1978, THIN FILM PROCESSES, P257
[5] PARRIS NA, 1984, INSTRUMENTAL LIQUID, P61
[6] RITTER E, 1975, PHYS THIN FILMS, V8, P1
[7] ROSSI RC, 1988, HDB THIN FILM DEPOSI, P80
[8] STRUCTURAL-PROPERTIES OF TITANIUM-DIOXIDE FILMS DEPOSITED IN AN RF GLOW-DISCHARGE
WILLIAMS, LM
HESS, DW
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (04): : 1810 - 1819
[9] 1980, JCPDS POWDER DIFFRAC