STRUCTURAL-PROPERTIES OF TITANIUM-DIOXIDE FILMS DEPOSITED IN AN RF GLOW-DISCHARGE

被引：165

作者：

WILLIAMS, LM

HESS, DW

机构：

[1] UNIV CALIF BERKELEY LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720

[2] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.572220

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1810 / 1819

页数：10

共 24 条

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GRANNEMANN, WW .

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[3]

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[4]

Clark R.J.H., 1968, CHEM TITANIUM VANADI, P266

[5]

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[8] GROWTH CHARACTERISTICS OF RUTILE FILM BY CHEMICAL VAPOR DEPOSITION [J].

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NOREIKA, AJ .

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[9] ION SURFACE INTERACTIONS DURING VAPOR-PHASE CRYSTAL-GROWTH BY SPUTTERING, MBE, AND PLASMA-ENHANCED CVD - APPLICATIONS TO SEMICONDUCTORS [J].

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[10]

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