KINETICS OF REACTIVE SPUTTER DEPOSITION OF TITANIUM OXIDES

[1] ANDERSSON S, 1963, ARK KEMI, V21, P413

[2] BAILEY RF, 1973, JUN T C SPUTT TECHN

[3] DeVries R. C., 1954, AM CERAM SOC B, V33, P370

[4] JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 5151 - &

[5] GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979

[6] HAAS G, 1952, VACUUM, V2

[7] OPTICAL PROPERTIES AND OXIDATION OF EVAPORATED TITANIUM FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1957, 47 (02) : 125 - 129

[8] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176

[9] THIN FILMS OF TITANIUM + TITANIUM OXIDE FOR MICROMINIATURIZATION [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 38 - &

[10] KUBASCHEWSKI O, 1958, OXIDATION METALS

[1] ANDERSSON S, 1963, ARK KEMI, V21, P413

[2] BAILEY RF, 1973, JUN T C SPUTT TECHN

[3] DeVries R. C., 1954, AM CERAM SOC B, V33, P370

[4] JOSEPHSON TUNNELING BARRIERS BY RF SPUTTER ETCHING IN AN OXYGEN PLASMA [J]. JOURNAL OF APPLIED PHYSICS, 1971, 42 (12) : 5151 - &

[5] GREINER JH, 1974, J APPL PHYS, V45, P32, DOI 10.1063/1.1662979

[6] HAAS G, 1952, VACUUM, V2

[7] OPTICAL PROPERTIES AND OXIDATION OF EVAPORATED TITANIUM FILMS [J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1957, 47 (02) : 125 - 129

[8] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176

[9] THIN FILMS OF TITANIUM + TITANIUM OXIDE FOR MICROMINIATURIZATION [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 38 - &

[10] KUBASCHEWSKI O, 1958, OXIDATION METALS