TIO2 FILM PROPERTIES AS A FUNCTION OF PROCESSING TEMPERATURE

[1] Barksdale J, 1949, TITANIUM ITS OCCUREN

[2] BURGER RM, 1967, FUNDAMENTALS SILICON, V1, P78

[3] ELECTRICAL AND OPTICAL PROPERTIES OF RUTILE SINGLE CRYSTALS [J]. PHYSICAL REVIEW, 1952, 87 (05): : 876 - 886

[4] TITANIUM-DIOXIDE DIELECTRIC FILMS PREPARED BY VAPOR REACTION [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1463 - &

[5] GROWTH CHARACTERISTICS OF RUTILE FILM BY CHEMICAL VAPOR DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (10) : 1310 - +

[6] Harbison D. R., 1969, Thin film dielectrics, P254

[7] HARBISON DR, 1969, THESIS U TEXAS

[8] HASS G, 1952, VACUUM, V2, P331

[9] HEAVENS OS, 1960, REP PROG PHYS, V23, P2

[10] KRYLOVA TN, 1960, OPT SPECTROSC, V9, P339

[1] Barksdale J, 1949, TITANIUM ITS OCCUREN

[2] BURGER RM, 1967, FUNDAMENTALS SILICON, V1, P78

[3] ELECTRICAL AND OPTICAL PROPERTIES OF RUTILE SINGLE CRYSTALS [J]. PHYSICAL REVIEW, 1952, 87 (05): : 876 - 886

[4] TITANIUM-DIOXIDE DIELECTRIC FILMS PREPARED BY VAPOR REACTION [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1463 - &

[5] GROWTH CHARACTERISTICS OF RUTILE FILM BY CHEMICAL VAPOR DEPOSITION [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (10) : 1310 - +

[6] Harbison D. R., 1969, Thin film dielectrics, P254

[7] HARBISON DR, 1969, THESIS U TEXAS

[8] HASS G, 1952, VACUUM, V2, P331

[9] HEAVENS OS, 1960, REP PROG PHYS, V23, P2

[10] KRYLOVA TN, 1960, OPT SPECTROSC, V9, P339