TIO2 FILM PROPERTIES AS A FUNCTION OF PROCESSING TEMPERATURE

[11] SPUTTERED TITANIUM OXIDE FILMS FOR MICROCIRCUIT APPLICATIONS [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 14 - &

[12] MASERJIAN J, 1966, CONDUCTION THROUGH T

[13] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (10) : 1013 - &

[14] CRYSTALLIZATION OF AMORPHOUS TITANIUM DIOXIDE FILMS PREPARED BY VACUUM-EVAPORATION [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1966, 21 (02) : 335 - &

[15] SKINNER GH, 1940, TITANIUM COMPOUNDS, P21

[16] SKURAI S, 1963, REV ELEC COMMUN LAB, V11, P178

[17] TITANIUM-DIOXIDE COATINGS - ROOM-TEMPERATURE DEPOSITION [J]. INDUSTRIAL & ENGINEERING CHEMISTRY PRODUCT RESEARCH AND DEVELOPMENT, 1972, 11 (01): : 92 - &

[18] Swaroop B., 1969, Thin film dielectrics, P407

[19] VAPOR DEPOSITION OF TIO2 [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (01) : 96 - &

[20] Young L, 1961, ANODIC OXIDE FILMS

[11] SPUTTERED TITANIUM OXIDE FILMS FOR MICROCIRCUIT APPLICATIONS [J]. IEEE TRANSACTIONS ON COMPONENT PARTS, 1964, CP11 (02): : 14 - &

[12] MASERJIAN J, 1966, CONDUCTION THROUGH T

[13] STRUCTURAL EVALUATION OF SILICON OXIDE FILMS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (10) : 1013 - &

[14] CRYSTALLIZATION OF AMORPHOUS TITANIUM DIOXIDE FILMS PREPARED BY VACUUM-EVAPORATION [J]. JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1966, 21 (02) : 335 - &

[15] SKINNER GH, 1940, TITANIUM COMPOUNDS, P21

[16] SKURAI S, 1963, REV ELEC COMMUN LAB, V11, P178

[17] TITANIUM-DIOXIDE COATINGS - ROOM-TEMPERATURE DEPOSITION [J]. INDUSTRIAL & ENGINEERING CHEMISTRY PRODUCT RESEARCH AND DEVELOPMENT, 1972, 11 (01): : 92 - &

[18] Swaroop B., 1969, Thin film dielectrics, P407

[19] VAPOR DEPOSITION OF TIO2 [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1968, 7 (01) : 96 - &

[20] Young L, 1961, ANODIC OXIDE FILMS