650-A SELF-ALIGNED-GATE PSEUDOMORPHIC AL0.48IN0.52AS/GA0.20IN0.80AS HIGH ELECTRON-MOBILITY TRANSISTORS

被引:48
作者
NGUYEN, LD
BROWN, AS
THOMPSON, MA
JELLOIAN, LM
LARSON, LE
MATLOUBIAN, M
机构
[1] Hughes Research Laboratories, Malibu, CA
关键词
D O I
10.1109/55.144991
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We wish to report on the design and fabrication of a 650-angstrom self-aligned-gate pseudomorphic Al0.48In0.52As/Ga0.20In0.80As high electron mobility transistor (HEMT) with a state-of-the-art current gain cutoff frequency over 300 GHz. This work clearly demonstrates the potential of sub-0.1-mu-m gate-length HEMT's for near-future microwave and millimeter-wave applications.
引用
收藏
页码:143 / 145
页数:3
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