MATRIX SPECTROSCOPY OF AG, TA, W, AND MO TRAPPED IN AR AND XE USING A TRIODE SPUTTERING SOURCE

被引：35

作者：

SCHOCH, F ^{[1
]}

KAY, E ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95114

来源：

JOURNAL OF CHEMICAL PHYSICS | 1973年 / 59卷 / 02期

关键词：

D O I：

10.1063/1.1680081

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：718 / 728

页数：11

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