CRYSTALLIZATION OF AMORPHOUS SILICON FILMS

被引：143

作者：

KOSTER, U ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1978年 / 48卷 / 02期

关键词：

D O I：

10.1002/pssa.2210480207

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：313 / 321

页数：9

共 19 条

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[3] Blum N. A., 1972, Journal of Non-Crystalline Solids, V11, P242, DOI 10.1016/0022-3093(72)90006-3
[4] BLUM NA, 1976, J NON-CRYST SOLIDS, V22, P29, DOI 10.1016/0022-3093(76)90004-1
[5] STRUCTURAL, OPTICAL, AND ELECTRICAL PROPERTIES OF AMORPHOUS SILICON FILMS
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[6] DEPOSITION AND PROPERTIES OF SILICON ON GRAPHITE SUBSTRATES
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[7] CRYSTALLIZATION OF AMORPHOUS SILICON FILMS BY ND-YAG LASER-HEATING
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ZEIGER, HJ
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (04) : 224 - 226
[8] UBER DIE KRISTALLISATION AUFGEDAMPFTER ANTIMONSCHICHTEN
GOTZBERGER, A
[J]. ZEITSCHRIFT FUR PHYSIK, 1955, 142 (02): : 182 - 200
[9] GUTZOW I, 1971, ADV NUCLEATION CRYST, P10
[10] PROPAGATION MECHANISM OF GERMANIUM DENDRITES
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