STUDY OF INTERFACE DIFFUSION OF TI AND TIN PVD LAYERS BY BREMSSTRAHLUNG-INDUCED AES

被引：4

作者：

MEISEL, W ^{[1
]}

HANZEL, D ^{[1
]}

机构：

[1] EDVARD KARDELJ UNIV,J STEFAN INST,YU-61111 LJUBLJANA,YUGOSLAVIA

来源：

SURFACE AND INTERFACE ANALYSIS | 1992年 / 18卷 / 04期

关键词：

D O I：

10.1002/sia.740180407

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The influence of heat treatment in ultrahigh vacuum (UHV) on Ti and TiN layers coated by physical vapour deposition (PVD) has been studied by AES, XPS and bremsstrahlung-induced AES. It could be concluded that up to 500-degrees-C (1 h) the Ti layer does not change significantly. At the TiN/steel substrate interface, however, a counter-diffusion of nitrogen and adventitious oxygen takes place, resulting in partial nitridation of the steel substrate and oxidation of the coating.

引用

页码：284 / 288

页数：5