HEAT-TREATMENT STUDIES OF OXYGEN-DEFECT-IMPURITY INTERACTIONS IN SILICON

被引:11
作者
CLELAND, JW
机构
关键词
D O I
10.1149/1.2124392
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:2127 / 2132
页数:6
相关论文
共 16 条
[1]  
AMMERLAAN CAJ, 1972, CRYSTAL LATTICE DEFE, V3, P47
[2]   EFFECT OF CARBON ON THERMAL DONOR FORMATION IN HEAT-TREATED PULLED SILICON CRYSTALS [J].
BEAN, AR ;
NEWMAN, RC .
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1972, 33 (02) :255-&
[3]   COOLING RATES OF LARGE-DIAMETER SILICON-CRYSTALS [J].
CAPPER, P ;
WILKES, JG .
APPLIED PHYSICS LETTERS, 1978, 32 (03) :187-189
[4]  
CLELAND JW, 1981, UNPUB J NUCL MATER
[5]  
CLELAND JW, 1980, 3RD P INT C NEUTR TR
[6]   OPTICAL STUDIES OF RADIATION-DAMAGE IN NEUTRON TRANSMUTATION DOPED SILICON [J].
FUKUOKA, N ;
CLELAND, JW .
RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1980, 51 (3-4) :215-222
[7]  
FULLER CS, 1959, CHEM REV, V59, P1
[8]  
HELMREICH D, 1977, ELECTROCHEMICAL SOC, P626
[9]   MECHANISM OF THE FORMATION OF DONOR STATES IN HEAT-TREATED SILICON [J].
KAISER, W ;
FRISCH, HL ;
REISS, H .
PHYSICAL REVIEW, 1958, 112 (05) :1546-1554
[10]   ELECTRICAL AND OPTICAL PROPERTIES OF HEAT-TREATED SILICON [J].
KAISER, W .
PHYSICAL REVIEW, 1957, 105 (06) :1751-1756