MEASURING THE TENSOR NATURE OF STRESS IN SILICON USING POLARIZED OFF-AXIS RAMAN-SPECTROSCOPY

被引:28
作者
LOECHELT, GH
CAVE, NG
MENENDEZ, J
机构
[1] MOTOROLA INC,MAT RES & STRATEG TECHNOL,MAT CHARACTERIZAT LAB,MESA,AZ 85202
[2] ARIZONA STATE UNIV,DEPT PHYS & ASTRON,TEMPE,AZ 85287
关键词
D O I
10.1063/1.114125
中图分类号
O59 [应用物理学];
学科分类号
摘要
Polarized off-axis Raman spectroscopy is a technique for measuring the complete tensor nature of stress fields in semiconductors. By combining incident light tilted away from the normal axis with polarization of the incident and scattered beams, any Raman-active optical phonon mode can be selectively studied. Once the frequencies and intensities of these phonons are measured, the complete stress tensor can be uniquely determined. This technique has been applied macroscopically to mechanically deformed silicon wafers under biaxial tension. The results of this approach compare favorably with the stress calculated by means of the theory of elasticity.© 1995 American Institute of Physics.
引用
收藏
页码:3639 / 3641
页数:3
相关论文
共 14 条
  • [1] MICRO-RAMAN SPECTROSCOPY FOR CHARACTERIZATION OF SEMICONDUCTOR-DEVICES
    ABSTREITER, G
    [J]. APPLIED SURFACE SCIENCE, 1991, 50 (1-4) : 73 - 78
  • [2] EFFECT OF STATIC UNIAXIAL STRESS ON RAMAN SPECTRUM OF SILICON
    ANASTASSAKIS, E
    PINCZUK, A
    BURSTEIN, E
    POLLAK, FH
    CARDONA, M
    [J]. SOLID STATE COMMUNICATIONS, 1970, 8 (02) : 133 - +
  • [3] MORPHIC EFFECTS .2. EFFECTS OF EXTERNAL FORCES ON FREQUENCIES OF Q=O OPTICAL PHONONS
    ANASTASSAKIS, E
    BURSTEIN, E
    [J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1971, 32 (03) : 563 - +
  • [4] STRAIN AT SI-SIO2 INTERFACES STUDIED BY MICRO-RAMAN SPECTROSCOPY
    BRUNNER, K
    ABSTREITER, G
    KOLBESEN, BO
    MEUL, HW
    [J]. APPLIED SURFACE SCIENCE, 1989, 39 (1-4) : 116 - 126
  • [5] STRESS-INDUCED SHIFTS OF FIRST-ORDER RAMAN FREQUENCIES OF DIAMOND AND ZINC-BLENDE-TYPE SEMICONDUCTORS
    CERDEIRA, F
    BUCHENAUER, CJ
    CARDONA, M
    POLLAK, FH
    [J]. PHYSICAL REVIEW B-SOLID STATE, 1972, 5 (02): : 580 - +
  • [6] MICRO-RAMAN STUDY OF STRESS-DISTRIBUTION IN LOCAL ISOLATION STRUCTURES AND CORRELATION WITH TRANSMISSION ELECTRON-MICROSCOPY
    DEWOLF, I
    VANHELLEMONT, J
    ROMANORODRIGUEZ, A
    NORSTROM, H
    MAES, HE
    [J]. JOURNAL OF APPLIED PHYSICS, 1992, 71 (02) : 898 - 906
  • [7] LOCAL-OXIDATION-INDUCED STRESS MEASURED BY RAMAN MICROPROBE SPECTROSCOPY
    KOBAYASHI, K
    INOUE, Y
    NISHIMURA, T
    HIRAYAMA, M
    AKASAKA, Y
    KATO, T
    IBUKI, S
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (06) : 1987 - 1989
  • [8] Kunio T., 1989, International Electron Devices Meeting 1989. Technical Digest (Cat. No.89CH2637-7), P837, DOI 10.1109/IEDM.1989.74183
  • [9] DESIGN OF 2 DEVICES FOR BIAXIAL STRESSES AND THEIR APPLICATION TO SILICON-WAFERS
    LIAROKAPIS, E
    RICHTER, W
    [J]. MEASUREMENT SCIENCE AND TECHNOLOGY, 1992, 3 (04) : 347 - 351
  • [10] RAMAN EFFECT IN CRYSTALS
    LOUDON, R
    [J]. ADVANCES IN PHYSICS, 1964, 13 (52) : 423 - &