THE ROLE OF CHLORINATED SURFACE-FILMS IN EXCIMER LASER ETCHING OF CU AT LOW CL2 PRESSURES

被引：10

作者：

BALLER, TS

VANVEEN, GNA

DIELEMAN, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575715

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1409 / 1413

页数：5

共 12 条

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