LASER-INDUCED CHEMICAL ETCHING OF SILICON IN CHLORINE ATMOSPHERE .2. CONTINUOUS IRRADIATION

被引：45

作者：

MOGYOROSI, P

PIGLMAYER, K

KULLMER, R

BAUERLE, D

机构：

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 04期

关键词：

D O I：

10.1007/BF00617934

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：293 / 299

页数：7

共 29 条

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