A STUDY OF THIN SILICON DIOXIDE FILMS USING INFRARED-ABSORPTION TECHNIQUES

被引：162

作者：

BOYD, IW

WILSON, JIB

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1982年 / 53卷 / 06期

关键词：

D O I：

10.1063/1.331239

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：4166 / 4172

页数：7

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