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OXIDATION OF SILICON BY ION-IMPLANTATION AND LASER IRRADIATION
被引:9
作者
:
CHIANG, SW
论文数:
0
引用数:
0
h-index:
0
CHIANG, SW
LIU, YS
论文数:
0
引用数:
0
h-index:
0
LIU, YS
REIHL, RF
论文数:
0
引用数:
0
h-index:
0
REIHL, RF
机构
:
来源
:
APPLIED PHYSICS LETTERS
|
1981年
/ 39卷
/ 09期
关键词
:
D O I
:
10.1063/1.92879
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
引用
收藏
页码:752 / 754
页数:3
相关论文
共 18 条
[1]
STUDY OF SILICON-OXIDES PREPARED BY OXYGEN IMPLANTATION INTO SILICON
BADAWI, MH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
BADAWI, MH
ANAND, KV
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
ANAND, KV
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1977,
10
(14)
: 1931
-
1942
[2]
Chalmers B., 1964, PRINCIPLES SOLIDIFIC
[3]
CHAMPAGNE R, 1977, SOLID STATE TECHNOL, V20, P62
[4]
COMPARATIVE STUDY OF PLASMA ANODIZATION OF SILICON IN A COLUMN OF A DC GLOW DISCHARGE
COPELAND, MA
论文数:
0
引用数:
0
h-index:
0
COPELAND, MA
PAPPU, R
论文数:
0
引用数:
0
h-index:
0
PAPPU, R
[J].
APPLIED PHYSICS LETTERS,
1971,
19
(06)
: 199
-
&
[5]
SEGREGATION AND INCREASED DOPANT SOLUBILITY IN PT-IMPLANTED AND LASER-ANNEALED SI LAYERS
CULLIS, AG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CULLIS, AG
WEBBER, HC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
WEBBER, HC
POATE, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
POATE, JM
SIMONS, AL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SIMONS, AL
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(04)
: 320
-
322
[6]
THIN SIO2-FILMS FORMED BY OXYGEN ION-IMPLANTATION IN SILICON - ELECTRON-MICROSCOPE INVESTIGATIONS OF SI-SIO2 INTERFACE STRUCTURES AND THEIR C-V CHARACTERISTICS
DYLEWSKI, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
DYLEWSKI, J
JOSHI, MC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
JOSHI, MC
[J].
THIN SOLID FILMS,
1976,
37
(02)
: 241
-
248
[7]
INFLUENCE OF O-16, C-12, N-14, AND NOBLE-GASES ON CRYSTALLIZATION OF AMORPHOUS SI LAYERS
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
KENNEDY, EF
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
CSEPREGI, L
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(10)
: 4241
-
4246
[8]
SILICON OXIDE FILMS GROWN IN A MICROWAVE DISCHARGE
KRAITCHMAN, J
论文数:
0
引用数:
0
h-index:
0
KRAITCHMAN, J
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(11)
: 4323
-
+
[9]
SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
: 2703
-
+
[10]
THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
: 131
-
136
←
1
2
→
共 18 条
[1]
STUDY OF SILICON-OXIDES PREPARED BY OXYGEN IMPLANTATION INTO SILICON
BADAWI, MH
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
BADAWI, MH
ANAND, KV
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
UNIV KENT,DEPT ELECTR,CANTERBURY CT2 7NJ,KENT,ENGLAND
ANAND, KV
[J].
JOURNAL OF PHYSICS D-APPLIED PHYSICS,
1977,
10
(14)
: 1931
-
1942
[2]
Chalmers B., 1964, PRINCIPLES SOLIDIFIC
[3]
CHAMPAGNE R, 1977, SOLID STATE TECHNOL, V20, P62
[4]
COMPARATIVE STUDY OF PLASMA ANODIZATION OF SILICON IN A COLUMN OF A DC GLOW DISCHARGE
COPELAND, MA
论文数:
0
引用数:
0
h-index:
0
COPELAND, MA
PAPPU, R
论文数:
0
引用数:
0
h-index:
0
PAPPU, R
[J].
APPLIED PHYSICS LETTERS,
1971,
19
(06)
: 199
-
&
[5]
SEGREGATION AND INCREASED DOPANT SOLUBILITY IN PT-IMPLANTED AND LASER-ANNEALED SI LAYERS
CULLIS, AG
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
CULLIS, AG
WEBBER, HC
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
WEBBER, HC
POATE, JM
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
POATE, JM
SIMONS, AL
论文数:
0
引用数:
0
h-index:
0
机构:
BELL TEL LABS INC,MURRAY HILL,NJ 07974
BELL TEL LABS INC,MURRAY HILL,NJ 07974
SIMONS, AL
[J].
APPLIED PHYSICS LETTERS,
1980,
36
(04)
: 320
-
322
[6]
THIN SIO2-FILMS FORMED BY OXYGEN ION-IMPLANTATION IN SILICON - ELECTRON-MICROSCOPE INVESTIGATIONS OF SI-SIO2 INTERFACE STRUCTURES AND THEIR C-V CHARACTERISTICS
DYLEWSKI, J
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
DYLEWSKI, J
JOSHI, MC
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
UNIV BOMBAY,DEPT PHYS,BOMBAY 400019,INDIA
JOSHI, MC
[J].
THIN SOLID FILMS,
1976,
37
(02)
: 241
-
248
[7]
INFLUENCE OF O-16, C-12, N-14, AND NOBLE-GASES ON CRYSTALLIZATION OF AMORPHOUS SI LAYERS
KENNEDY, EF
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
KENNEDY, EF
CSEPREGI, L
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
CSEPREGI, L
MAYER, JW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
MAYER, JW
SIGMON, TW
论文数:
0
引用数:
0
h-index:
0
机构:
CAL TECH,PASADENA,CA 91125
SIGMON, TW
[J].
JOURNAL OF APPLIED PHYSICS,
1977,
48
(10)
: 4241
-
4246
[8]
SILICON OXIDE FILMS GROWN IN A MICROWAVE DISCHARGE
KRAITCHMAN, J
论文数:
0
引用数:
0
h-index:
0
KRAITCHMAN, J
[J].
JOURNAL OF APPLIED PHYSICS,
1967,
38
(11)
: 4323
-
+
[9]
SILICON OXIDATION IN AN OXYGEN PLASMA EXCITED BY MICROWAVES
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
[J].
JOURNAL OF APPLIED PHYSICS,
1965,
36
(09)
: 2703
-
+
[10]
THE MECHANISMS FOR SILICON OXIDATION IN STEAM AND OXYGEN
LIGENZA, JR
论文数:
0
引用数:
0
h-index:
0
LIGENZA, JR
SPITZER, WG
论文数:
0
引用数:
0
h-index:
0
SPITZER, WG
[J].
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS,
1960,
14
: 131
-
136
←
1
2
→