THERMAL-INSTABILITY IN P-CHANNEL TRANSISTORS WITH REOXIDIZED NITRIDED OXIDE GATE DIELECTRICS

被引:2
作者
FISHBEIN, B [1 ]
DOYLE, B [1 ]
CONRAN, C [1 ]
机构
[1] DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
关键词
D O I
10.1109/16.163544
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
[No abstract available]
引用
收藏
页码:2672 / 2672
页数:1
相关论文
共 3 条
[1]  
DOYLE B, 1992, IEDM, P529
[2]   CHANNEL HOT-CARRIER STRESSING OF REOXIDIZED NITRIDED OXIDE P-MOSFETS [J].
DUNN, GJ ;
KRICK, JT .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (04) :901-906
[3]   OPTIMIZATION OF LOW-PRESSURE NITRIDATION REOXIDATION OF SIO2 FOR SCALED MOS DEVICES [J].
YANG, W ;
JAYARAMAN, R ;
SODINI, CG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (07) :935-944