学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
THERMAL-INSTABILITY IN P-CHANNEL TRANSISTORS WITH REOXIDIZED NITRIDED OXIDE GATE DIELECTRICS
被引:2
作者
:
FISHBEIN, B
论文数:
0
引用数:
0
h-index:
0
机构:
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
FISHBEIN, B
[
1
]
DOYLE, B
论文数:
0
引用数:
0
h-index:
0
机构:
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
DOYLE, B
[
1
]
CONRAN, C
论文数:
0
引用数:
0
h-index:
0
机构:
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
CONRAN, C
[
1
]
机构
:
[1]
DIGITAL EQUIPMENT CORP,77 REED RD,HUDSON,MA 01749
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1992年
/ 39卷
/ 11期
关键词
:
D O I
:
10.1109/16.163544
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
[No abstract available]
引用
收藏
页码:2672 / 2672
页数:1
相关论文
共 3 条
[1]
DOYLE B, 1992, IEDM, P529
[2]
CHANNEL HOT-CARRIER STRESSING OF REOXIDIZED NITRIDED OXIDE P-MOSFETS
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
PENN STATE UNIV,UNIVERSITY PK,PA 16802
PENN STATE UNIV,UNIVERSITY PK,PA 16802
DUNN, GJ
;
KRICK, JT
论文数:
0
引用数:
0
h-index:
0
机构:
PENN STATE UNIV,UNIVERSITY PK,PA 16802
PENN STATE UNIV,UNIVERSITY PK,PA 16802
KRICK, JT
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1991,
38
(04)
:901
-906
[3]
OPTIMIZATION OF LOW-PRESSURE NITRIDATION REOXIDATION OF SIO2 FOR SCALED MOS DEVICES
[J].
YANG, W
论文数:
0
引用数:
0
h-index:
0
YANG, W
;
JAYARAMAN, R
论文数:
0
引用数:
0
h-index:
0
JAYARAMAN, R
;
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
SODINI, CG
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(07)
:935
-944
←
1
→
共 3 条
[1]
DOYLE B, 1992, IEDM, P529
[2]
CHANNEL HOT-CARRIER STRESSING OF REOXIDIZED NITRIDED OXIDE P-MOSFETS
[J].
DUNN, GJ
论文数:
0
引用数:
0
h-index:
0
机构:
PENN STATE UNIV,UNIVERSITY PK,PA 16802
PENN STATE UNIV,UNIVERSITY PK,PA 16802
DUNN, GJ
;
KRICK, JT
论文数:
0
引用数:
0
h-index:
0
机构:
PENN STATE UNIV,UNIVERSITY PK,PA 16802
PENN STATE UNIV,UNIVERSITY PK,PA 16802
KRICK, JT
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1991,
38
(04)
:901
-906
[3]
OPTIMIZATION OF LOW-PRESSURE NITRIDATION REOXIDATION OF SIO2 FOR SCALED MOS DEVICES
[J].
YANG, W
论文数:
0
引用数:
0
h-index:
0
YANG, W
;
JAYARAMAN, R
论文数:
0
引用数:
0
h-index:
0
JAYARAMAN, R
;
SODINI, CG
论文数:
0
引用数:
0
h-index:
0
SODINI, CG
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1988,
35
(07)
:935
-944
←
1
→