QUANTITATIVE AES ANALYSIS OF TI SILICIDE AND CO SILICIDE FILMS

被引：20

作者：

CHEN, WD ^{[1
]}

BENDER, H ^{[1
]}

VANDERVORST, W ^{[1
]}

MAES, HE ^{[1
]}

机构：

[1] IMEC VZW,B-3030 LEUVEN,BELGIUM

来源：

SURFACE AND INTERFACE ANALYSIS | 1988年 / 12卷 / 1-12期

关键词：

D O I：

10.1002/sia.740120216

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：151 / 155

页数：5

相关论文

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