A COMPARISON OF AES AND RBS ANALYSIS OF THE COMPOSITION OF REACTIVELY SPUTTERED TISIX FILMS

被引：8

作者：

BLOM, HO ^{[1
]}

STRIDH, B ^{[1
]}

BERG, S ^{[1
]}

SUNDGREN, JE ^{[1
]}

机构：

[1] LINKOPING INST TECHNOL,S-58183 LINKOPING,SWEDEN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期

关键词：

D O I：

10.1116/1.571914

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：497 / 499

页数：3

共 11 条

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